Scandium nitride
| Names | |
|---|---|
| IUPAC name Scandium nitride | |
| Other names Azanylidynescandium Nitridoscandium | |
| Identifiers | |
| 3D model (JSmol) | |
| ChemSpider | |
| ECHA InfoCard | 100.042.938 | 
| EC Number | 
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| PubChem CID | |
| CompTox Dashboard (EPA) | |
| 
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| Properties | |
| ScN | |
| Molar mass | 58.963 | 
| Density | 4.4 g/cm3 | 
| Melting point | 2,600 °C (4,710 °F; 2,870 K) | 
| Hazards | |
| GHS labelling: | |
| Danger | |
| H228 | |
| Related compounds | |
| Other anions | Scandium phosphide Scandium arsenide Scandium antimonide Scandium bismuthide | 
| Other cations | Yttrium nitride Lutetium nitride | 
| Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa). Infobox references | |
Scandium nitride (ScN) is a binary III-V indirect bandgap semiconductor. It is composed of the scandium cation and the nitride anion. It forms crystals that can be grown on tungsten foil through sublimation and recondensation. It has a rock-salt crystal structure with lattice constant of 0.451 nanometer, an indirect bandgap of 0.9 eV and direct bandgap of 2 to 2.4 eV. These crystals can be synthesized by dissolving nitrogen gas with indium-scandium melts, magnetron sputtering, MBE, HVPE and other deposition methods. Scandium nitride is also an effective gate for semiconductors on a silicon dioxide (SiO2) or hafnium dioxide (HfO2) substrate. Scandium nitride is the first nitride semiconductor reported to be synthesized without an active Nitrogen plasma source using the Molecular Beam Epitaxy (MBE) technique.